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Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation

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    SYSNO ASEP0308150
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleInfluence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation
    TitleVliv vzorku na plazma v depozičním/odprašovacím reaktoru: experiment a počítačová simulace
    Author(s) Brzobohatý, Oto (UPT-D) RID, ORCID, SAI
    Buršíková, V. (CZ)
    Nečas, D. (CZ)
    Valtr, M. (CZ)
    Trunec, D. (CZ)
    Source TitleJournal of Physics D-Applied Physics. - : Institute of Physics Publishing - ISSN 0022-3727
    Roč. 41, č. 3 (2008), 035213:1-8
    Number of pages8 s.
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsr. f. plasma ; computer simulation ; secondary electron emision ; plasma deposition ; plasma sputtering
    Subject RIVBL - Plasma and Gas Discharge Physics
    R&D ProjectsGA202/07/1669 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z20650511 - UPT-D (2005-2011)
    UT WOS000253177800036
    DOI10.1088/0022-3727/41/3/035213
    AnnotationThe aim of the present work was to investigate the influence of the substrate material on the plasma enhanced chemical vapor deposition and the plasma sputtering of thin films in low pressure parallel-plate r.f. discharges. It was observed that the deposition or sputtering rates differed above different materials, e.g., above a substrate and substrate electrode. Moreover, the substrates placed on the bottom r.f. electrode seemed to be mirrored in the thickness of a thin film deposited or sputtered on the upper grounded electrode. The influence of the substrate material on the plasma parameters was studied via Particle In Cell/Monte Carlo computer simulation. According to our finding the mirroring of the substrate was caused by different secondary electron emission yields of the substrate material and material of the substrate electrode.
    WorkplaceInstitute of Scientific Instruments
    ContactMartina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
    Year of Publishing2008
Number of the records: 1  

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