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Phase elements by means of photo-lithographic system employing a spatial light modulator

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    SYSNO ASEP0304116
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    R&D Document TypeM - Uspořádání konference
    TitlePhase elements by means of photo-lithographic system employing a spatial light modulator
    Author(s) Aubrecht, Ivo (URE-Y)
    Miler, Miroslav (URE-Y)
    Pala, Jan (URE-Y)
    Issue dataBellingham: SPIE The International Society for Optical Engineering, 2003
    ISBN0-8194-4837-0
    ISSN0277-786X
    Source TitlePhotonics, Devices and Systems II / Hrabovský M. ; Senderáková D. ; Tománek P.
    Pagess. 63-66
    SeriesProceedings of SPIE.
    Series number5036
    Number of pages4 s.
    ActionPhotonics Prague'2002 /4./
    Event typeK - Konference
    Event date26.05.2002-29.05.2002
    VEvent locationPrague
    CountryCZ - Czech Republic
    Event typeWRD
    Languageeng - English
    CountryUS - United States
    Keywordsspatial light modulators ; photolitography ; photoresists
    Subject RIVBH - Optics, Masers, Lasers
    R&D ProjectsGA202/01/0428 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z2067918 - URE-Y
    AnnotationThe system employs a spatial light modulator (SML), between a pair of crossed polarizers, and an electronic shutter. Transmission of the SLM with the polarizers is controlled by graphic software that defines which pixels are fully transparent and which are fully opaque. While a particular binary graphics is on the SLM the electronic shutter allows light to pass for a certain time. The graphics is imaged, by an objective, onto a photoresist plate. A mercury lamp is used as a light source. The graphics changes after each exposition and the whole sequence of images determines the resultant surface-relief modulation.
    WorkplaceInstitute of Radio Engineering and Electronics
    ContactPetr Vacek, vacek@ufe.cz, Tel.: 266 773 413, 266 773 438, 266 773 488
    Year of Publishing2004

Number of the records: 1  

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