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Origin of the photoluminescence line at 0.8 eV in undoped and Si-doped GaSb grown by MOVPE

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    SYSNO ASEP0303955
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleOrigin of the photoluminescence line at 0.8 eV in undoped and Si-doped GaSb grown by MOVPE
    Author(s) Agert, C. (DE)
    Gladkov, Petar (URE-Y)
    Bett, A. W. (DE)
    Source TitleSemiconductor Science and Technology. - : Institute of Physics Publishing - ISSN 0268-1242
    Roč. 17, č. 1 (2002), s. 39-46
    Number of pages8 s.
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsphotoluminescence ; silicon ; epitaxial growth
    Subject RIVBM - Solid Matter Physics ; Magnetism
    CEZAV0Z2067918 - URE-Y
    AnnotationWe study electrical properties and the photoluminescence /PL/ of Si-doped bulk GaSb grown by metal-organic vapor phase epitaxy. Si was found to behave a substitution shallow acceptor in GaSb with activation energy of 9 meV, which is responsible for the 0.8 eV line in the PL spectrum of GaSb.
    WorkplaceInstitute of Radio Engineering and Electronics
    ContactPetr Vacek, vacek@ufe.cz, Tel.: 266 773 413, 266 773 438, 266 773 488
    Year of Publishing2003

Number of the records: 1  

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