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Sensitivity of CdS photoresistors in ultraviolet spectrum and technology

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    SYSNO ASEP0303844
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    R&D Document TypeM - Uspořádání konference
    TitleSensitivity of CdS photoresistors in ultraviolet spectrum and technology
    Author(s) Franc, J. (CZ)
    Novotný, Jan (URE-Y)
    Jirásek, L. (CZ)
    Petráň, S.
    Kliment, P.
    Issue dataPlzeň: Západočeská univerzita, 2001
    ISBN80-7082-758-0
    Source TitleInternational Conference Applied Electronics 2001 / Pinker J.
    Pagess. 70-73
    Number of pages4 s.
    ActionApplied Electronics 2001
    Event typeK - Konference
    Event date05.09.2001-06.09.2001
    VEvent locationPilsen
    CountryCZ - Czech Republic
    Event typeEUR
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordsphotoresistors ; ultraviolet detectors ; instrumentation
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsKSK1010104 Projekt 04/01:4046 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z2067918 - URE-Y
    AnnotationSeveral groups of photoresistors based on thin film of evaporated CdS were prepared. Groups were distinguished in concentrations of acceptors (Cu) and donors (Cl) which were used in activation of layers. Each group was characterised by means of slope in visible range and by relative sensitivity in UVA region. Relative sensitivity in UVA region decreases when concentrations of activators increasee.
    WorkplaceInstitute of Radio Engineering and Electronics
    ContactPetr Vacek, vacek@ufe.cz, Tel.: 266 773 413, 266 773 438, 266 773 488
    Year of Publishing2002

Number of the records: 1  

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