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Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
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SYSNO 0185122 Title Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds Author(s) Zajíčková, L. (CZ)
Janča, J. (CZ)
Peřina, Vratislav (UJF-V) RIDSource Title Thin Solid Films. Roč. 338, - (1999), s. 49-59. - : Elsevier Document Type Článek v odborném periodiku Language eng Country GB Permanent Link http://hdl.handle.net/11104/0081539
Number of the records: 1