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Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds

  1. 1.
    Zajíčková, L., Janča, J., Peřina, V. Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds. Thin Solid Films. 1999, 338(-), 49-59. ISSN 0040-6090. E-ISSN 1879-2731.

Number of the records: 1  

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