Number of the records: 1
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
- 1.Zajíčková, L., Janča, J., Peřina, V. Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds. Thin Solid Films. 1999, 338(-), 49-59. ISSN 0040-6090. E-ISSN 1879-2731.
Number of the records: 1