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Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds

  1. 1.
    0185122 - UJF-V 20000293 RIV GB eng J - Journal Article
    Zajíčková, L. - Janča, J. - Peřina, Vratislav
    Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds.
    Thin Solid Films. Roč. 338, - (1999), s. 49-59. ISSN 0040-6090. E-ISSN 1879-2731
    Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders
    Impact factor: 1.101, year: 1999
    Permanent Link: http://hdl.handle.net/11104/0081539
     

Number of the records: 1  

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