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Boron electrical activation in dual B+N and B+Ar ion-implanted Si

  1. 1.
    Odzhaev, V. B. - Popok, V. N. - Prosolovich, V. S. - Hnatowicz, Vladimír
    Boron electrical activation in dual B+N and B+Ar ion-implanted Si.
    Applied Physics A - Materials Science & Processing. Roč. 62, - (1996), s. 355-358. ISSN 0947-8396. E-ISSN 1432-0630
    R&D Projects: GA AV ČR KSK1010601
    http://hdl.handle.net/11104/0001999

Number of the records: 1  

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