Number of the records: 1
Boron electrical activation in dual B+N and B+Ar ion-implanted Si
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$a eng $d eng 102 $a DE 200 1-
$a Boron electrical activation in dual B+N and B+Ar ion-implanted Si 463 -1
$1 001 cav_un_epca*0252058 $1 011 $a 0947-8396 $e 1432-0630 $1 200 1 $a Applied Physics A - Materials Science & Processing $v Roč. 62, - (1996), s. 355-358 $1 210 $c Springer 700 -1
$3 cav_un_auth*0042110 $a Odzhaev $b V. B. $y XX $4 070 701 -1
$3 cav_un_auth*0042111 $a Popok $b V. N. $y XX $4 070 701 -1
$3 cav_un_auth*0042112 $a Prosolovich $b V. S. $y XX $4 070 701 -1
$3 cav_un_auth*0100914 $a Hnatowicz $b Vladimír $p UJF-V $w Research with Beams of Ions and Neutrons $4 070 $T Ústav jaderné fyziky AV ČR, v. v. i.
Number of the records: 1