Number of the records: 1
Boron electrical activation in dual B+N and B+Ar ion-implanted Si
- 1.Odzhaev, V. B., Popok, V. N., Prosolovich, V. S., Hnatowicz, V. Boron electrical activation in dual B+N and B+Ar ion-implanted Si. Applied Physics A - Materials Science & Processing. 1996, 62(-), 355-358. ISSN 0947-8396. E-ISSN 1432-0630.
Number of the records: 1