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Boron electrical activation in dual B+N and B+Ar ion-implanted Si

  1. 1.
    Odzhaev, V. B., Popok, V. N., Prosolovich, V. S., Hnatowicz, V. Boron electrical activation in dual B+N and B+Ar ion-implanted Si. Applied Physics A - Materials Science & Processing. 1996, 62(-), 355-358. ISSN 0947-8396. E-ISSN 1432-0630.

Number of the records: 1  

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