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RF plasma deposition and characterization of organosilicon thin films from TEOS+O.SUB.2 gas mixtures

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    0183552 - UJF-V 950139 RIV CZ eng C - Conference Paper (international conference)
    Peřina, Vratislav - Janča, J.
    RF plasma deposition and characterization of organosilicon thin films from TEOS+O.SUB.2 gas mixtures.
    Proceedings of 17th Symposium on Plasma Physics and Technology. Praha: EF ČVUT ÚFP AV ČR, 1995 - (Píchal, J.), s. 275-277
    [Symposium on Plasma Physics and Technology /17./. Prague (CZ), 13.06.1995-16.06.1995]
    Permanent Link: http://hdl.handle.net/11104/0080038


     
     

Number of the records: 1  

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