0181196 - UFCH-W 20010111 RIV NL eng J - Journal Article
Lykhach, Y. - Sotiropoulou, D. - Thiam, Michel Malick - Pešička, J. - Nehasil, V.
EELS Study of Rh Particle Growth on ZrO₂ Substrate with Different Deposition Conditions.
Surface Science. 482-485, - (2001), s. 789-796. ISSN 0039-6028. E-ISSN 1879-2758
R&D Projects: GA ČR GA202/99/1714; GA MŠMT VS97116
Institutional research plan: CEZ:AV0Z4040901
Keywords : rhodium * zirconium * auger electron spectroscopy
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 2.189, year: 2001

EELS and AES have been used to monitor the formation of Rh films on ZrO2(100) single crystalline substrates. Rhodium was evaporated step by at various substrate temperatures. The surface morphology of the deposited material influence EELS spectra, so that the relative metal coverage of the substrate can be calculed. The EELS and AES results were compared and the conclusions concerning the deposit morphology were verified by means of transmission electron microscopy.
Permanent Link: http://hdl.handle.net/11104/0077782