Laser-induced Thin Film Formation from a Gaseous Mixture of Trimethylsilylacetylene and Methyl Acrylate

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SYSNO ASEP	0181165
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Ostatní články
Title	Laser-induced Thin Film Formation from a Gaseous Mixture of Trimethylsilylacetylene and Methyl Acrylate
Author(s)	Morita, H. (JP) Ono, H. (JP) Bastl, Zdeněk (UFCH-W)_{RID, ORCID} Pola, Josef (UCHP-M)_{RID, ORCID, SAI}
Source Title	Journal of Photochemistry and Photobiology A-Chemistry. - : Elsevier - ISSN 1010-6030 Roč. 140, č. 3 (2001), s. 243-248
Number of pages	6 s.
Language	eng - English
Country	NL - Netherlands
Keywords	N2 laser-induced film formation ; trimethylsilylacetylene ; methyl acrylate
Subject RIV	CF - Physical ; Theoretical Chemistry
CEZ	AV0Z4040901 - UFCH-W
Annotation	Under irradiation with N2 laser light gaseous trimethylsilylacetylene(TMeSiA) and a gaseous mixture of TMeSiA and methylacrylate(MA) produced thin solid films on quartz window of an irradiation vessel. From the analysis of FT-IR and X-ray photoelectron spectra of the deposited films it was shown that Si-C bond of TMeSiA was cleaved by two photon absorption of laser light to produce TMeSi radical and the silanes. TMeSi radical reacted with MA at C=C and C=O bonds to produce Si-C and Si-O bond in the film.
Workplace	J. Heyrovsky Institute of Physical Chemistry
Contact	Michaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
Year of Publishing	2002

Number of the records: 1