Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

Name: Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
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Kulas, J.; Roušar, I.; Krýsa, J.; Jirkovský, Jaromír

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Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

1.

SYSNO	0180739
Title	Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO₂ Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
Author(s)	Kulas, J. (CZ) Roušar, I. (CZ) Krýsa, J. (CZ) Jirkovský, Jaromír (UFCH-W)_RID
Source Title	Journal of Applied Electrochemistry. Roč. 28, č. 8 (1998), s. 843-853. - : SPRINGER
Document Type	Článek v odborném periodiku
Grant	GA203/96/0883 GA ČR - Czech Science Foundation (CSF)
Language	eng
Country	GB
Permanent Link	http://hdl.handle.net/11104/0077378

Number of the records: 1