Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

Name: Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
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Kulas, J.; Roušar, I.; Krýsa, J.; Jirkovský, Jaromír

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Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

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Kulas, J. - Roušar, I. - Krýsa, J. - Jirkovský, Jaromír
Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO₂ Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits.
Journal of Applied Electrochemistry. Roč. 28, č. 8 (1998), s. 843-853. ISSN 0021-891X. E-ISSN 1572-8838
R&D Projects: GA ČR GA203/96/0883
Impact factor: 0.928, year: 1998
http://hdl.handle.net/11104/0077378

Number of the records: 1