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Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
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$a Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO2 Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits 463 -1
$1 001 cav_un_epca*0256866 $1 011 $a 0021-891X $e 1572-8838 $1 200 1 $a Journal of Applied Electrochemistry $v Roč. 28, č. 8 (1998), s. 843-853 $1 210 $c SPRINGER 700 -1
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$3 cav_un_auth*0102816 $a Jirkovský $b Jaromír $p UFCH-W $w Electrochemical Materials $4 070 $T Ústav fyzikální chemie Jaroslava Heyrovského AV ČR, v. v. i. 856 4-
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Number of the records: 1