Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

Name: Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
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Kulas, J.; Roušar, I.; Krýsa, J.; Jirkovský, Jaromír

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Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

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KULAS, J., ROUŠAR, I., KRÝSA, J., JIRKOVSKÝ, J. Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO₂ Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits. Journal of Applied Electrochemistry. 1998, 28(8), 843-853. ISSN 0021-891X. E-ISSN 1572-8838.

Number of the records: 1