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UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films
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$a UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films 463 -1
$1 001 cav_un_epca*0256165 $1 011 $a 0268-2605 $e 1099-0739 $1 200 1 $a Applied Organometallic Chemistry $v Roč. 13, - (1999), s. 643-647 $1 210 $c Wiley 700 -1
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$3 cav_un_auth*0102745 $a Bastl $b Zdeněk $p UFCH-W $w Low-dimensional Systems $4 070 $T Ústav fyzikální chemie Jaroslava Heyrovského AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0103332 $a Pola $b Josef $p UCHP-M $w Department of Laser Chemistry $4 070 $T Ústav chemických procesů AV ČR, v. v. i. 856 4-
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Number of the records: 1