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UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films
- 1.OUCHI, A., KOGA, Y., BASTL, Zdeněk, POLA, Josef. UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films. Applied Organometallic Chemistry. 1999, 13(-), 643-647. ISSN 0268-2605. E-ISSN 1099-0739.
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