Number of the records: 1
UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films
- 1.0180696 - UFCH-W 990111 RIV GB eng J - Journal Article
Ouchi, A. - Koga, Y. - Bastl, Zdeněk - Pola, Josef
UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
Applied Organometallic Chemistry. Roč. 13, - (1999), s. 643-647. ISSN 0268-2605. E-ISSN 1099-0739
R&D Projects: GA ČR GA203/96/1217
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 1.270, year: 1999
Permanent Link: http://hdl.handle.net/11104/0077340
Number of the records: 1
