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UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films

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    0180696 - UFCH-W 990111 RIV GB eng J - Journal Article
    Ouchi, A. - Koga, Y. - Bastl, Zdeněk - Pola, Josef
    UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
    Applied Organometallic Chemistry. Roč. 13, - (1999), s. 643-647. ISSN 0268-2605. E-ISSN 1099-0739
    R&D Projects: GA ČR GA203/96/1217
    Subject RIV: CF - Physical ; Theoretical Chemistry
    Impact factor: 1.270, year: 1999
    Permanent Link: http://hdl.handle.net/11104/0077340
     

Number of the records: 1  

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