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UV Laser-Induced Photolysis of 1,3-Disilacyclobutane in Oxygen for Chemical Vapour Deposition of Nano-Sized Polyoxocarbosilane Films
- 1.0166262 - UCHP-M 20013119 RIV US eng J - Journal Article
Pola, Josef - Vítek, Josef - Bastl, Zdeněk - Šubrt, Jan
UV Laser-Induced Photolysis of 1,3-Disilacyclobutane in Oxygen for Chemical Vapour Deposition of Nano-Sized Polyoxocarbosilane Films.
Journal of Organometallic Chemistry. Roč. 640, 1-2 (2001), s. 170-176. ISSN 0022-328X. E-ISSN 1872-8561
R&D Projects: GA ČR GA203/00/1288; GA MŠMT OC 523.60
Keywords : 1,3-Disilacyclobutane * silene * laser photolysis
Subject RIV: CH - Nuclear ; Quantum Chemistry
Impact factor: 1.803, year: 2001
The multi-pulse ArF laser irradiation into gaseous 1,3-disilacyclobutane-O2 mixture in ixcess of buffer gas occurs as non-explosive chemical vapour deposition of solid methylsilicone films, whereas the single-pulse irradiation into the gaseous mixture in the absence of buffer gas results in explosive chemical vapour deposition of solid nano-structured polyoxocarbosilanes poor in hydrogen.
Permanent Link: http://hdl.handle.net/11104/0063392
Number of the records: 1