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Microwave plasma chemical vapour deposition of nanocrystalline diamond films
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SYSNO ASEP 0134355 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Microwave plasma chemical vapour deposition of nanocrystalline diamond films Author(s) Popov, C. (DE)
Jelínek, Miroslav (FZU-D) RID, ORCID
Bulíř, Jiří (FZU-D) RID, ORCID, SAI
Kulich, W. (DE)Source Title Proceedings of International Symposium on Plasma Chemistry /16./. - Roma : xx, 2003 Pages s. ispc-014-1 - ispc-014-5 Publication form CD-ROM - CD-ROM Action International Symposium on Plasma Chemistry /16./ Event date 22.06.2003-27.06.2003 VEvent location Taormina Country IT - Italy Event type EUR Language eng - English Country IT - Italy Keywords nanocrystalline diamond films ; microwave plasma chemical vapour deposition Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z1010914 - FZU-D Annotation Nanocrystalline diamond films have been prepared by microwave plasma chemical vapour deposition from methan/nitrogen mixtures and the influence of the gas phase composition on the properties of the deposited films was investigated. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2004
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