Tantalum ions produced by 1064 nm pulsed laser irradiation
1.
SYSNO ASEP
0133983
Document Type
J - Journal Article
R&D Document Type
Journal Article
Subsidiary J
Ostatní články
Title
Tantalum ions produced by 1064 nm pulsed laser irradiation
Author(s)
Torrisi, L. (IT) Gammino, S. (IT) Andó, L. (IT) Láska, Leoš (FZU-D)
Source Title
Journal of Applied Physics. - : AIP Publishing
- ISSN 0021-8979
Roč. 91, - (2002), s. 4685-4692
Number of pages
8 s.
Language
eng - English
Country
US - United States
Keywords
pulsed laser irradiation ; high-temperature plasma production ; Nd:YAG laser
Subject RIV
BH - Optics, Masers, Lasers
CEZ
AV0Z1010921 - FZU-D
Annotation
A Q-switched Nd:YAG laser (1064 nm wavelength) with a 9 ns pulse width 1-900 mJ pulse energy, and 0.5 mm2 target spot, is employed to irradiate tantalum targets in vacuum.The irradiation produces a strong etching of the metal and forms a plasma in front of the target.The plasma contains neutrals and ions with a high charge state and wide energy distribution.
