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Surface photovoltage measurements in ćc-Si:H: manifestation of the bottom space charge region

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    0133889 - FZU-D 20020172 RIV US eng J - Journal Article
    Švrček, Vladimír - Pelant, Ivan - Fojtík, Petr - Fejfar, Antonín
    Surface photovoltage measurements in ćc-Si:H: manifestation of the bottom space charge region.
    Journal of Applied Physics. Roč. 92, č. 5 (2002), s. 2323-2329. ISSN 0021-8979. E-ISSN 1089-7550
    Institutional research plan: CEZ:AV0Z1010914
    Keywords : ćc-Si:H * surface photovoltage measurements * mathematical model
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 2.281, year: 2002

    We discuss results of surface photovoltage (U) measurements for d=10ćm thick layers of undoped hydrogenated microcrystalline silicon. By applying excitation with low energetic photons a photovolatge peak appears on a curve U=u(ŕ). We present a mathematical model that enable us to link this peak to photocharge separation in the bottom space charge region at the interface ćc-Si:H/substrat.
    Permanent Link: http://hdl.handle.net/11104/0031838


     
     

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