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Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique
- 1.0133845 - FZU-D 20020024 RIV GB eng J - Journal Article
Jelínek, Miroslav - Kulish, W. - Lančok, Ján - Popov, C. - Bulíř, Jiří - Delplancke-Ogletree, M. P.
Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique.
Molecular Crystals and Liquid Crystals. Roč. 374, - (2002), s. 207-210. ISSN 1058-725X
Institutional research plan: CEZ:AV0Z1010914
Keywords : laser deposition * carbon nitride * radiofrequency discharge * hollow cathode discharge
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 0.457, year: 2002
Highly nitrogenated CNx films were created by pulsed laser deposition, combined with radiofrequency and hollow cathode discharges. The N/C ratio higher than 1 was measured. Deposition set- up and results of optical measurement are discussed.
Permanent Link: http://hdl.handle.net/11104/0031800
Number of the records: 1