0133760 - FZU-D 20020141 RIV NL eng J - Journal Article
Shaginyan, L. R. - Mišina, Martin - Zemek, Josef - Musil, Jindřich - Regent, F. - Britun, V. F.
Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering.
Thin Solid Films. Roč. 408, - (2002), s. 136-147. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA ČR GV106/96/K245; GA ČR GA106/99/D086
Institutional research plan: CEZ:AV0Z1010914
Keywords : hardness * sputtering * nitrides * alloys
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.443, year: 2002

W-Ti-N films were deposited by the reactive d.c. magnetron sputtering from W-Ti(30 at.
Permanent Link: http://hdl.handle.net/11104/0031719