0133320 - FZU-D 20010115 RIV NL eng J - Journal Article
Kulisch, W. - Popov, C. - Zambov, L. M. - Bulíř, Jiří - Delplancke-Ogletree, M. P. - Lančok, Ján - Jelínek, Miroslav
Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films.
Thin Solid Films. 377-378, - (2000), s. 148-155. ISSN 0040-6090. E-ISSN 1879-2731
Institutional research plan: CEZ:AV0Z1010914
Keywords : carbon nitride * annealing * pulsed laser deposition * inductively coupled plasma chemical vapour deposition
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.160, year: 2000

The thermal stability of nitrogen-rich amorphous carbon nitride films is investigated from room temperature up to 600oC. The films were deposited by three different methods,namely pulsed laser deposition,inductively coupled plasma chemical capour deposition with gaseous precursors and ICP-CVD utilizing transport reactions.
Permanent Link: http://hdl.handle.net/11104/0031297