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Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering
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SYSNO ASEP 0133304 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering Author(s) Jastrabík, Lubomír (FZU-D) RID, ORCID
Soukup, Ladislav (FZU-D)
Shaginyan, L. R. (UA)
Onoprienko, A. A. (UA)Source Title Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972
Roč. 123, - (2000), s. 261-267Number of pages 7 s. Language eng - English Country NL - Netherlands Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects IAA1010827 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z1010914 - FZU-D Annotation Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2002
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