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Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering
- 1.Jastrabík, L., Soukup, L., Shaginyan, L. R., Onoprienko, A. A. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Surface and Coatings Technology. 2000, 123(-), 261-267. ISSN 0257-8972. E-ISSN 1879-3347.
Number of the records: 1