Number of the records: 1  

Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering

  1. 1.
    Jastrabík, L., Soukup, L., Shaginyan, L. R., Onoprienko, A. A. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Surface and Coatings Technology. 2000, 123(-), 261-267. ISSN 0257-8972. E-ISSN 1879-3347.

Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.