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Mettalic etching by high power Nd:yttrium-aluminium-garnet pulsed lasr irradiation

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    0133108 - FZU-D 20000471 RIV US eng J - Journal Article
    Torrisi, L. - Ciavola, G. - Gammino, S. - Ando, L. - Barna, A. - Láska, Leoš - Krása, Josef
    Mettalic etching by high power Nd:yttrium-aluminium-garnet pulsed lasr irradiation.
    Review of Scientific Instruments. Roč. 71, č. 11 (2000), s. 4330-4334. ISSN 0034-6748. E-ISSN 1089-7623
    Institutional research plan: CEZ:AV0Z1010921
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.239, year: 2000

    A Nd:yttrium-aluminium-garnet pulsed laser, with 1064nm wavelength, 9 ns pulse width, and 0.9 J maximum pulse energy, is employed to irradiate in vacuum different metal targets (Al,Ti,Ni,Cu,Ta,W.Au, and Pb). A simple theoretical approach is presented to justify obtained results.
    Permanent Link: http://hdl.handle.net/11104/0031096


     
     

Number of the records: 1  

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