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The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100}(2x1)-C.sub.2H./sub.4
- 1.0132833 - FZU-D 20000086 RIV DE eng J - Journal Article
Baumgärtel, P. - Lindsay, R. - Schaff, O. - Terborg, R. - Hoeft, J. T. - Polčík, Martin - Bradshaw, A. M. - Carbone, M. - Piancastelli, M. N. - Zanoni, R. - Toomes, R. L. - Woodruff, D. P.
The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100}(2x1)-C2H4.
New Journal of Physics. Roč. 1, - (1999), s. 20.1-20.15. ISSN 1367-2630. E-ISSN 1367-2630
Institutional research plan: CEZ:AV0Z1010914
Subject RIV: BM - Solid Matter Physics ; Magnetism
Using the technique of photoelectron diffraction in the scanned energy mode the authors show that the Si dimer separation on the Si{110} surface following the adsorption of ethene is 2.36 angstrem.
Permanent Link: http://hdl.handle.net/11104/0030830
Number of the records: 1