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An ellipsometric study of W thin films deposited on Si

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    0132806 - FZU-D 20000058 RIV NL eng J - Journal Article
    Deineka, Alexander - Tarasenko, A. A. - Jastrabík, Lubomír - Chvostová, Dagmar - Boušek, Jaroslav
    An ellipsometric study of W thin films deposited on Si.
    Thin Solid Films. Roč. 339, - (1999), s. 216-219. ISSN 0040-6090. E-ISSN 1879-2731
    R&D Projects: GA AV ČR IAA2010536
    Institutional research plan: CEZ:AV0Z1010914
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.101, year: 1999

    The results of spectral and angle-dependent ellipsometric measurements of r.f. magnetron-sputtered very thin tungsten films (2/8nm) deposited onto {100} oriented silicon substrates have been reported.
    Permanent Link: http://hdl.handle.net/11104/0030805


     
     

Number of the records: 1  

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