Number of the records: 1
An ellipsometric study of W thin films deposited on Si
- 1.0132806 - FZU-D 20000058 RIV NL eng J - Journal Article
Deineka, Alexander - Tarasenko, A. A. - Jastrabík, Lubomír - Chvostová, Dagmar - Boušek, Jaroslav
An ellipsometric study of W thin films deposited on Si.
Thin Solid Films. Roč. 339, - (1999), s. 216-219. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA AV ČR IAA2010536
Institutional research plan: CEZ:AV0Z1010914
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.101, year: 1999
The results of spectral and angle-dependent ellipsometric measurements of r.f. magnetron-sputtered very thin tungsten films (2/8nm) deposited onto {100} oriented silicon substrates have been reported.
Permanent Link: http://hdl.handle.net/11104/0030805
Number of the records: 1