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Characterization of laser pattern a-Si:H thin films by combined AFM/Local Current Measurements

  1. 1.
    0132755 - FZU-D 20000007 RIV DE eng J - Journal Article
    Rezek, Bohuslav - Stuchlík, Jiří - Fejfar, Antonín - Kočka, Jan - Nebel, C. E. - Stutzmann, M.
    Characterization of laser pattern a-Si:H thin films by combined AFM/Local Current Measurements.
    Physica Status Solidi A. Roč. 170, č. 1 (1998), s. R1-R2. ISSN 0031-8965
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 0.782, year: 1998

    Laser interference crystallization of amorphous hydrogenated silicon, followed by selective plasma-enhanced deposition and etching can be used for new large area microelectronic applications.
    Permanent Link: http://hdl.handle.net/11104/0030757
     

Number of the records: 1  

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