Number of the records: 1  

Applicability of raman scattering for the characterization of nanocrystalline silicon

    1.
    SYSNO ASEP0132467
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleApplicability of raman scattering for the characterization of nanocrystalline silicon
    Author(s) Ossadnik, Ch. (DE)
    Vepřek, S. (DE)
    Gregora, Ivan (FZU-D) RID, ORCID
    Source TitleThin Solid Films. - : Elsevier - ISSN 0040-6090
    Roč. 337, - (1999), s. 148-151
    Number of pages4 s.
    Languageeng - English
    CountryNL - Netherlands
    Subject RIVBM - Solid Matter Physics ; Magnetism
    CEZAV0Z1010914 - FZU-D
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2000

Number of the records: 1  

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