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Polycrystalline silicon thin films produced by interference laser crystallization of amorphous silicon

  1. 1.
    Rezek, B., Nebel, C. E., Stutzmann, M. Polycrystalline silicon thin films produced by interference laser crystallization of amorphous silicon. Japanese Journal of Applied Physics. 1999, 38(-), 1083-1084. ISSN 0021-4922. E-ISSN 1347-4065.

Number of the records: 1  

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