0132305 - FZU-D 990247 RIV US eng C - Conference Paper (international conference)
Mahan, A. H. - Vaněček, Milan - Poruba, Aleš - Vorlíček, Vladimír - Crandall, R. S. - Williamson, D. L.
Low defect density microcrystalline-Si deposited by the hot wire technique.
1-55899-427-1. In: Aporphous and Microcrystalline Silicon Technology-1998. Warrendale, Pennsylvania: Materials Research Society, 1998 - (Schropp, R.; Branz, H.; Hack, M.; Shimizu, I.; Wagner, S.), s. 825-830. Materials Research Society Symposium Proceedings., 507.
[Amorphous and Microcrystalline Silicon Technology-1998. San Francisco (US), 14.04.1998-17.04.1998]
R&D Projects: GA MŠMT OK 268
Grant - others:subcontract(DE) DE-ACO283CH 10093
Subject RIV: BM - Solid Matter Physics ; Magnetism
Permanent Link: http://hdl.handle.net/11104/0030336