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Formation of Ti.sub.1-xSi./sub.x and Ti.sub.1-xSi./sub.xN films by magnetron co-sputtering

  1. 1.
    Musil, J., Jankovcová, H., Cibulka, V. Formation of Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering. Czechoslovak Journal of Physics. 1999, 49(3), 359-372. ISSN 0011-4626.

Number of the records: 1  

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