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Characteristics of an ECR plasma sputtering source at low Ar/N2 gas pressures for thin film synthesis
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SYSNO 0132072 Title Characteristics of an ECR plasma sputtering source at low Ar/N2 gas pressures for thin film synthesis Author(s) Shoyama, H. (JP)
Mišina, Martin (FZU-D)
Miyake, S. (JP)Source Title Japanese Journal of Applied Physics. Roč. 36, 7B (1997), s. 4583-4587. - : Institute of Physics Publishing Document Type Článek v odborném periodiku Language eng Country JP Permanent Link http://hdl.handle.net/11104/0030110
Number of the records: 1