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Photoelectron escape depth
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SYSNO ASEP 0131838 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Photoelectron escape depth Author(s) Zemek, Josef (FZU-D) RID, ORCID
Hucek, Stanislav (FZU-D)
Jablonski, A. (PL)
Tilinin, I. S. (PL)Source Title Journal of Electron Spectroscopy and Related Phenomena. - : Elsevier - ISSN 0368-2048
Roč. 76, - (1995), s. 443-447Language eng - English Country NL - Netherlands R&D Projects GA202/95/0032 GA ČR - Czech Science Foundation (CSF) Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 1999
Number of the records: 1