Number of the records: 1  

Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films

  1. 1.
    SYSNO ASEP0131738
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleDepth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films
    Author(s) Kučírková, A. (CZ)
    Navrátil, K. (CZ)
    Zemek, Josef (FZU-D) RID, ORCID
    Source TitleThin Solid Films. - : Elsevier - ISSN 0040-6090
    Roč. 323, - (1998), s. 53-58
    Number of pages6 s.
    Languageeng - English
    CountryNL - Netherlands
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsIAA1010609 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing1999

Number of the records: 1  

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