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Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films
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$a eng 102 $a NL 200 1-
$a Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films 215 $a 6 s. 463 -1
$1 001 cav_un_epca*0257662 $1 011 $a 0040-6090 $e 1879-2731 $1 200 1 $a Thin Solid Films $v Roč. 323, - (1998), s. 53-58 $1 210 $c Elsevier 700 -1
$3 cav_un_auth*0042077 $a Kučírková $b A. $y CZ $4 070 701 -1
$3 cav_un_auth*0037180 $a Navrátil $b K. $y CZ $4 070 701 -1
$3 cav_un_auth*0100630 $a Zemek $b Josef $p FZU-D $w Optical Materials $4 070 $T Fyzikální ústav AV ČR, v. v. i.
Number of the records: 1