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Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films

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    0131738 - FZU-D 980451 RIV NL eng J - Journal Article
    Kučírková, A. - Navrátil, K. - Zemek, Josef
    Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films.
    Thin Solid Films. Roč. 323, - (1998), s. 53-58. ISSN 0040-6090. E-ISSN 1879-2731
    R&D Projects: GA AV ČR IAA1010609
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.019, year: 1998
    Permanent Link: http://hdl.handle.net/11104/0029787

     
     

Number of the records: 1  

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