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Structural changes of plasma deposited SiOxCyHz thin films attained by thermal annealing

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    0105672 - UJF-V 20043246 RIV CZ eng J - Journal Article
    Franclová, J. - Kučerová, V. - Burčíková, V. - Zajíčková, L. - Peřina, Vratislav
    Structural changes of plasma deposited SiOxCyHz thin films attained by thermal annealing.
    [Strukturální změny plazmově deponovaných tenkých vrstev SiOxCyHz tepelně zatížených žíháním.]
    Czechoslovak Journal of Physics. Roč. 54, č. 9 (2004), C847-852. ISSN 0011-4626.
    [Proceedings of the Symposium on Plasma and Technology /21./. Praha, 14.06.2004-17.06.2004]
    R&D Projects: GA AV ČR KSK1010104
    Keywords : deposited films * plasma enhanced CVD * HMDSO
    Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders
    Impact factor: 0.292, year: 2004

    The objective of the present work was to investigate the influence of thermal annealing on the optical and mechanical properties as well as on the chemical structure of plasma deposited SiOxCyHz films. The films were prepared by PECVD from HMDSO/oxygen mixtures under a wide range of deposition conditions. Their optical and mechanical properties were studied by spectroscopic ellipsometry and depth sensing indentation technique, respectively. The atomic composition was determined by RBS and ERDA measurements. FTIR analysis was used to find the densities of particular chemical bonds in the films. The annealed films exhibited changes of the refractive index and extinction coefficient. The refractive index always decreased with increasing annealing temperature. The observed increase in hardness and elastic modulus after annealing was probably correlated with dehydration of the films and an increase of Si-O-Si bonds with increasing annealing temperature.

    Je studován vliv žíhání na optické a mechanické vlastnosti a na chemickou strukturu plasmově deponovaných SiOxCyHz filmů. Optické a mechanické vlastnosti jsou studovány spektroskopickou elipsometrií a technikou hloubkově citlivých zářezů. Atomové složení bylo určeno měřeními RBS a ERDA. Hustoty chemických vazeb ve vrstvě byly určeny analýzou FTIR.
    Permanent Link: http://hdl.handle.net/11104/0000169
     
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