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Active polymer heterostructures for photoelectrical application
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SYSNO ASEP 0101359 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Active polymer heterostructures for photoelectrical application Title Aktivní polymerní heterostruktury pro fotoelektrické aplikace Author(s) Pfleger, Jiří (UMCH-V) RID
Pavlík, Martin (UMCH-V)
Plieth, W. (DE)
Vohlídal, J. (CZ)Source Title Congress Proceedings. - Paris : International Union of Pure and Applied Chemistry, 2004 Pages 5.1.5.1-5.1.5.2 Number of pages 2 s. Publication form www - www Action IUPAC International Symposium on Macromolecules, World Polymer Congress MACRO /40./ Event date 04.07.2004-09.07.2004 VEvent location Paris Country FR - France Event type WRD Language eng - English Country FR - France Keywords photoconductivity ; electrophoretic deposition Subject RIV CF - Physical ; Theoretical Chemistry R&D Projects IAA4050406 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GA203/04/0688 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z4050913 - UMCH-V Annotation Three alternative systems of polymer based photoelectrically sensitive structures were studied. The electrophoretic deposition proved to be an efficient method for preparation of nanostructured functional layers with a large area distributed heterojunction for charge generation. Workplace Institute of Macromolecular Chemistry Contact Eva Čechová, cechova@imc.cas.cz ; Tel.: 296 809 358 Year of Publishing 2005
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