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Microcrystalline silicon thin films studied by atomic force microscopy with electrical current detection
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SYSNO 0100521 Title Microcrystalline silicon thin films studied by atomic force microscopy with electrical current detection Title Tenké vrstvy mikrokrystalického křemíku studované mikroskopií atomových sil s detekcí elektrických proudů Author(s) Rezek, Bohuslav (FZU-D) RID, ORCID
Stuchlík, Jiří (FZU-D) RID, ORCID
Fejfar, Antonín (FZU-D) RID, ORCID, SAI
Kočka, Jan (FZU-D) RID, ORCID, SAISource Title Journal of Applied Physics. Roč. 92, č. 1 (2002), s. 587-593. - : AIP Publishing Document Type Článek v odborném periodiku Grant IAA1010809 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) IAB2949101 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GA202/98/0669 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z1010914 - FZU-D Language eng Country US Keywords amorphous silicon * microcrystalline silicon Permanent Link http://hdl.handle.net/11104/0008021
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