- Microcrystalline silicon thin films studied by atomic force microscop…
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Microcrystalline silicon thin films studied by atomic force microscopy with electrical current detection

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    SYSNO0100521
    TitleMicrocrystalline silicon thin films studied by atomic force microscopy with electrical current detection
    TitleTenké vrstvy mikrokrystalického křemíku studované mikroskopií atomových sil s detekcí elektrických proudů
    Author(s) Rezek, Bohuslav (FZU-D) RID, ORCID
    Stuchlík, Jiří (FZU-D) RID, ORCID
    Fejfar, Antonín (FZU-D) RID, ORCID, SAI
    Kočka, Jan (FZU-D) RID, ORCID, SAI
    Source Title Journal of Applied Physics. Roč. 92, č. 1 (2002), s. 587-593. - : AIP Publishing
    Document TypeČlánek v odborném periodiku
    Grant IAA1010809 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    IAB2949101 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GA202/98/0669 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z1010914 - FZU-D
    Languageeng
    CountryUS
    Keywords amorphous silicon * microcrystalline silicon
    Permanent Linkhttp://hdl.handle.net/11104/0008021
     
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