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XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films

  1. 1.
    SYSNO0100134
    TitleXPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
    TitleVyužití výtěžku fotoelektronů buzených čarou He II a rtg zářením ke studiu procesu aktivace Ti-Zr nevypařovaných tenkých vrstev
    Author(s) Zemek, Josef (FZU-D) RID, ORCID
    Jiříček, Petr (FZU-D) RID, ORCID, SAI
    Source Title Vacuum. Roč. 71, - (2003), s. 329-333. - : Elsevier
    Document TypeČlánek v odborném periodiku
    CEZAV0Z1010914 - FZU-D
    Languageeng
    CountryGB
    Keywords non-evaporable getters * Ti-Zr alloys * XPS * photoelectron yield * activation process * oxide reduction
    Permanent Linkhttp://hdl.handle.net/11104/0007640
     

Number of the records: 1  

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