XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films

Number of the records: 1

SYSNO ASEP	0100134
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Ostatní články
Title	XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
Title	Využití výtěžku fotoelektronů buzených čarou He II a rtg zářením ke studiu procesu aktivace Ti-Zr nevypařovaných tenkých vrstev
Author(s)	Zemek, Josef (FZU-D)_{RID, ORCID} Jiříček, Petr (FZU-D)_{RID, ORCID, SAI}
Source Title	Vacuum. - : Elsevier - ISSN 0042-207X Roč. 71, - (2003), s. 329-333
Number of pages	5 s.
Language	eng - English
Country	GB - United Kingdom
Keywords	non-evaporable getters ; Ti-Zr alloys ; XPS ; photoelectron yield ; activation process ; oxide reduction
Subject RIV	BM - Solid Matter Physics ; Magnetism
CEZ	AV0Z1010914 - FZU-D
Annotation	An activation process of the Ti-Zr thin films was studied by X-ray induced photoelectron spectroscopy and by measurements of ultraviolet induced photoelectron yield
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2005

Number of the records: 1