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XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
- 1.ZEMEK, J., JIŘÍČEK, P. XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films. Vacuum. 2003, 71(-), 329-333. ISSN 0042-207X. E-ISSN 1879-2715.
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