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Vapour pressure and heat capacities of metal organic precursors, Y(thd).sub.3./sub. and Zr(thd).sub.4./sub
- 1.0100075 - FZU-D 20040051 RIV NL eng J - Journal Article
Fulem, Michal - Růžička, K. - Růžička, V. - Šimeček, Tomislav - Hulicius, Eduard - Pangrác, Jiří
Vapour pressure and heat capacities of metal organic precursors, Y(thd)3 and Zr(thd)4
[Tlak nasycených par a měrná teplota organometalických prekurzorů Y(thd)3 and Zr(thd)4]
Journal of Crystal Growth. Roč. 264, - (2004), s. 192-200. ISSN 0022-0248. E-ISSN 1873-5002
R&D Projects: GA AV ČR KSK1010104
Keywords : static method * vapour pressure * metalorganic chemical vapor deposition * Y and Zr precursors * .alpha.-diketonate complexes
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.707, year: 2004
Permanent Link: http://hdl.handle.net/11104/0007582
Number of the records: 1