0026426 - FZÚ 2006 RIV CZ cze J - Journal Article
Výborný, Zdeněk
Elektronová litografie pro nanotechnologie.
[Electron beam lithography for nanotechnology.]
Jemná mechanika a optika. Roč. 50, 11-12 (2005), s. 313-318. ISSN 0447-6441
Institutional research plan: CEZ:AV0Z10100521
Keywords : lithography * photolithography * electron beam lithography * EBL * nanolithography * nanotechnology * SEM
Subject RIV: BM - Solid Matter Physics ; Magnetism
Permanent Link: http://hdl.handle.net/11104/0116677